Excimer laser annealing of ion-implanted 6H-silicon carbide

Y. Hishida, M. Watanabe, K. Nakashima, O. Eryu

Research output: Contribution to journalConference articlepeer-review

11 Citations (Scopus)

Abstract

XeCl excimer laser annealing of ion-implanted 6H-SiC was carried out. Laser annealed SiC was characterized by Rutherford backscattering, secondary ion mass spectroscopy (SIMS), electrical conductivity and photoluminescence. Laser irradiation reduced the χ values and increased electrical conductivity. The activation efficiency of the laser-annealed Al+ implanted SiC was estimated to be about 0.1%. SIMS results suggest that SiC substrates were not melted by laser irradiation and that the laser annealing effect proceeded in solid phase.

Original languageEnglish
Pages (from-to)II/-
JournalMaterials Science Forum
Volume338
Publication statusPublished - 2000
Externally publishedYes
EventICSCRM '99: The International Conference on Silicon Carbide and Related Materials - Research Triangle Park, NC, USA
Duration: 10-10-199915-10-1999

All Science Journal Classification (ASJC) codes

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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