TY - JOUR
T1 - Focused ion beam as a tool for graphene technology
T2 - Structural study of processing sequence by electron microscopy
AU - Rius, Gemma
AU - Tavabi, Amir H.
AU - Mestres, Narcis
AU - Eryu, Osamu
AU - Tanji, Takayoshi
AU - Yoshimura, Masamichi
PY - 2014
Y1 - 2014
N2 - Electron microscopy (EM) techniques are used to investigate the microstructure of ultrathin carbon layers obtained by focused ion beam induced deposition (FIBID). The investigation determines the crystalline structure, chemical bonding and elemental contents of FIBID-C materials. The effect of a thermal treatment to the ultrathin C films is analyzed. As-deposited FIBID-C is a metastable material transforming at mid-high temperatures. Evidence of its graphitization by metal catalysis is presented. Understanding of the heat transformation and crystallization is established based on the observations. Specifically, carbonization, H desorption decomposition, and graphitization, driven by high temperature metal-induced crystallization, are the identified processes. Demonstration of the graphitization of ultrathin FIBID-C enables a strategy towards graphene integrative planar technologies.
AB - Electron microscopy (EM) techniques are used to investigate the microstructure of ultrathin carbon layers obtained by focused ion beam induced deposition (FIBID). The investigation determines the crystalline structure, chemical bonding and elemental contents of FIBID-C materials. The effect of a thermal treatment to the ultrathin C films is analyzed. As-deposited FIBID-C is a metastable material transforming at mid-high temperatures. Evidence of its graphitization by metal catalysis is presented. Understanding of the heat transformation and crystallization is established based on the observations. Specifically, carbonization, H desorption decomposition, and graphitization, driven by high temperature metal-induced crystallization, are the identified processes. Demonstration of the graphitization of ultrathin FIBID-C enables a strategy towards graphene integrative planar technologies.
UR - https://www.scopus.com/pages/publications/84894311536
UR - https://www.scopus.com/inward/citedby.url?scp=84894311536&partnerID=8YFLogxK
U2 - 10.7567/JJAP.53.02BC22
DO - 10.7567/JJAP.53.02BC22
M3 - Article
AN - SCOPUS:84894311536
SN - 0021-4922
VL - 53
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
IS - 2 PART 2
M1 - 02BC22
ER -