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Correlation between Er-luminescent centers and defects in Si co-implanted with Er and O

  • K. Nakashima
  • , O. Eryu
  • , H. Akiyama
  • , Y. Maeda
  • , H. Ebisu

研究成果: ジャーナルへの寄稿会議記事査読

3   !!Link opens in a new tab 被引用数 (Scopus)

抄録

Correlation between evolution of Er-luminescent centers and the incorporation of Er and O during solid phase epitaxy (SPE) in Er and O co-implanted Si has been investigated, especially paying attention to the role of oxygen on segregation and trapping of Er. The SPE growth rate of the amorphous silicon layer, which is monitored in real time, is greatly enhanced from the beginning stage of SPE by more than one order magnitude in Si co-doped with Er and O, comparing with that of the undoped amorphous Si layer. The strong interaction between Er and O in circumstances under the presence of both species determines the concentration profiles of a majority of the Er and the O, leading to the formation of Er-luminescent centers.

本文言語英語
ページ(範囲)208-213
ページ数6
ジャーナルNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
175-177
DOI
出版ステータス出版済み - 04-2001
外部発表はい
イベント12th International Conference on Ion Beam Modification of Materials - Rio Grande do Sul, ブラジル
継続期間: 03-09-200008-09-2000

All Science Journal Classification (ASJC) codes

  • 核物理学および高エネルギー物理学
  • 器械工学

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