TY - JOUR
T1 - Nd-Fe-B Thin Films with Perpendicular Magnetic Anisotropy and High Coercivity Prepared by Pulsed Laser Annealing
AU - Okuda, Takashi
AU - Sugimura, Akinori
AU - Eryu, Osamu
AU - Serrona, Leo Karl E.B.
AU - Adachi, Nobuyasu
AU - Sakamoto, Isao
AU - Nakanishi, Akio
PY - 2003/11
Y1 - 2003/11
N2 - Amorphous, as-deposited Nd-Fe-B films prepared by RF-sputtering were annealed by irradiating pulsed KrF excimer laser (248 nm). A pulse of 20 ns in width and 4 kJ/m2 in power density was irradiated onto a 2 μm-thick as-deposited film kept at 400°C. It is observed that, by a single shot of the pulse, Nd2Fe14B φ phase crystallized with prominent texturing of c-axis along the film normal. Annealed films showed excellent magnetic characteristics; Ms= 0.978 T, M r = 0.906 T, iHc = 1272 kA/m, and (BH) MAX = 161 kJ/m3. This process is also found to be successfully applicable to a 20 μm-thick film. Using 2 μm-thick as-deposited film kept at 400°C, micro-magnet patterns of 100 μumin width and 1-2 mm in length were fabricated by irradiating a 20-ns pulse shot through a patterned mask. The patterned area revealed that magnetizations are directed along the film normal with coercivity higher than 1200 kA/m.
AB - Amorphous, as-deposited Nd-Fe-B films prepared by RF-sputtering were annealed by irradiating pulsed KrF excimer laser (248 nm). A pulse of 20 ns in width and 4 kJ/m2 in power density was irradiated onto a 2 μm-thick as-deposited film kept at 400°C. It is observed that, by a single shot of the pulse, Nd2Fe14B φ phase crystallized with prominent texturing of c-axis along the film normal. Annealed films showed excellent magnetic characteristics; Ms= 0.978 T, M r = 0.906 T, iHc = 1272 kA/m, and (BH) MAX = 161 kJ/m3. This process is also found to be successfully applicable to a 20 μm-thick film. Using 2 μm-thick as-deposited film kept at 400°C, micro-magnet patterns of 100 μumin width and 1-2 mm in length were fabricated by irradiating a 20-ns pulse shot through a patterned mask. The patterned area revealed that magnetizations are directed along the film normal with coercivity higher than 1200 kA/m.
KW - Hard magnetic materials
KW - High coercivity
KW - KrF excimer laser
KW - Micro patterned magnet
KW - Nd-Fe-B thin film
KW - NdFeB
KW - Perpendicular anisotropy
KW - Pulsed laser annealing
KW - RF-sputtering
UR - https://www.scopus.com/pages/publications/1642447044
UR - https://www.scopus.com/pages/publications/1642447044#tab=citedBy
U2 - 10.1143/jjap.42.6859
DO - 10.1143/jjap.42.6859
M3 - Article
AN - SCOPUS:1642447044
SN - 0021-4922
VL - 42
SP - 6859
EP - 6864
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
IS - 11
ER -